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Un-Masking a Faster Solution For Chip-Making
Thursday, November 27, 2008 - Anuradha Menon
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European researchers have developed a promising solution to 'mask-less' semiconductor lithography and generated intense interest among major industry players. Mask-less lithography (ML2) promises to rapidly reduce the costs and production times associated with low-volume device manufacture and prototyping. A mask is a type of template that allows semiconductor manufacturers to print the circuit design onto a silicon wafer for microchip production.    (source: cordis.europa.eu)


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